Chemical Vapor Deposition (journal)
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Abbreviated title (ISO 4)
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'Chem. Vap. Deposition' |
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| Discipline | Materials science |
| Language | English |
| Edited by | Peter Gregory |
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Publication history
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1995-present |
| Frequency | Monthly |
| 1.804 | |
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| ISSN | 0948-1907 (print) 1521-3862 (web) |
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Chemical Vapor Deposition is a monthly peer-reviewed scientific journal covering materials science. It publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. Frequent topics covered by the journal also include inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.
