Titanium disilicide
From Infogalactic: the planetary knowledge core
Names | |
---|---|
IUPAC name
Titanium disilicide
|
|
Other names
Titanium silicide
|
|
Identifiers | |
12039-83-7 | |
Jmol 3D model | Interactive image |
PubChem | 6336889 |
|
|
|
|
Properties | |
TiSi2 | |
Molar mass | 104.038 g/mol |
Appearance | black orthorhombic crystals |
Density | 4.02 g/cm3 |
Melting point | 1,470 °C (2,680 °F; 1,740 K) |
insoluble | |
Solubility | soluble in HF |
Vapor pressure | {{{value}}} |
Related compounds | |
Other cations
|
Zirconium disilicide Hafnium disilicide |
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
|
|
verify (what is ?) | |
Infobox references | |
Titanium disilicide (TiSi2) is an inorganic chemical compound.
Titanium silicide is used in the semiconductor industry. It is typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistors connections. In the microelectronic industry it is typically used in the C54 phase.
References
- ↑ Lua error in package.lua at line 80: module 'strict' not found.
<templatestyles src="Asbox/styles.css"></templatestyles>
Categories:
- Articles without EBI source
- Chemical pages without ChemSpiderID
- Articles without KEGG source
- Articles without UNII source
- Pages using collapsible list with both background and text-align in titlestyle
- Chemical articles using a fixed chemical formula
- Chembox articles without image
- Group 4 silicides
- Titanium compounds
- Inorganic compound stubs