Journal of Vacuum Science and Technology
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Former names
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Journal of Vacuum Science and Technology |
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Abbreviated title (ISO 4)
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J. Vac. Sci. Technol. |
| Discipline | Physics |
| Language | English |
| Edited by | Eray Aydil |
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Publication history
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1964-present |
| Frequency | Bimonthly |
| 2.322 (Part A) 1.464 (Part B) |
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The Journal of Vacuum Science and Technology is a peer-reviewed scientific journal published in two parts, A and B, by the American Institute of Physics on behalf of the American Vacuum Society. It was established in 1964 and the editor-in-chief is Eray Aydil (University of Minnesota).
History
- 1964–1982 Journal of Vacuum Science and Technology ISSN 0022-5355
- 1983–present Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
- 1983–1990 Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
- 1991–present Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Part A
Part A covers applied surface science, electronic materials and processing, fusion technology, plasma technology, surface science, thin films, vacuum metallurgy, and vacuum technology. According to the Journal Citation Reports, the journal has a 2014 impact factor of 2.322.[1]
Part B
Part B covers vacuum and plasma processing of various materials, their structural characterization, microlithography, and the physics and chemistry of submicrometer and nanometer structures and devices. According to the Journal Citation Reports, the journal has a 2014 impact factor of 1.464.[2]
